DLPLCR65EVM: Inquiry Regarding Laser Exposure Limit of DLPLCR65EVM / DLP6500 DMD

Part Number: DLPLCR65EVM

Dear Sir or Madam,

I am planning to use the TI DLPLCR65EVM, incorporating the DLP6500 DMD, in a laser-based optical system at the Department of Power Mechanical Engineering, National Tsing Hua University.

I would like to inquire about the allowable laser exposure limit and recommended operating conditions for the DMD module under femtosecond pulsed-laser illumination.

Our planned laser conditions at the DMD plane are as follows:

  • Wavelength: 520 nm
  • Operating mode: Pulsed laser
  • Average optical power: 4.4 W
  • Repetition rate: 1 MHz
  • Pulse width: 225 fs
  • Pulse energy: 4.4 μJ per pulse
  • Estimated peak power: approximately 19.6 MW
  • Beam diameter: approximately 6 mm

The estimated peak power was calculated using the pulse energy divided by the pulse width. The actual peak power may vary slightly depending on the temporal pulse profile.

Could you please advise whether these laser conditions are suitable for the DLPLCR65EVM / DLP6500 DMD?

In particular, we would appreciate information regarding:

  • Maximum allowable average power, irradiance, and fluence on the DMD surface
  • Maximum allowable pulse energy, peak power, and repetition rate for femtosecond pulsed-laser operation
  • Any pulse-width-dependent restrictions or derating guidelines
  • Recommended beam size, incident angle, and illumination uniformity
  • Possible reliability concerns or damage mechanisms, including micromirror damage, thermal loading, window damage, or coating degradation
  • Whether additional beam expansion, attenuation, or other protection measures are recommended for long-term operation

Thank you for your assistance.

Best regards,
Tinghan Tai
Department of Power Mechanical Engineering
National Tsing Hua University
Taiwan